Dongjin's bottom antireflective coatings are organic-based materials that eliminate reflective notchings and significantly reduce line width variations caused by photoresist film thickness changes over topography on a wafer. This product is offered for i-line, deep-UV, and 193-nm technologies.

DARC-K30 is a bottom antireflective coating that corresponds to photofabrication using a KrF photoresist.

- Good Conformality
- Wide Process Margin


DARC-K40 is a bottom antireflective coating that corresponds to photofabrication using a low thickness KrF photoresist.

- High Etch Rate
- Wide Process Margin


DARC-A20 is a bottom antireflective coating that corresponds to photofabrication using a ArF photoresist of acrylate type.

- Good Conformailty
- High Etch Rate
- Wide Process Margin


DARC-A40 is bottom antireflective coating that corresponds to photofabrication using a ArF photoresist of COMA and hybrid types.

- Good Conformailty
- High Etch Rate
- Wide Process Margin