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Dongjin is the leading supplier of advanced photoresists.
Photoresists are chemicals used in creating the
circuit patterns on chips. Dongjin's photoresists range
from its conventional g-line and i-line used in mainstream
devices to advanced i-line, deep UV and 193 nm.
| No
|
Product
Name |
Characteristic
|
Performance |
| Thk(§) |
Eop(msec) |
Resolution(§) |
1
|
DSAM-300
|
g-line
Normal Grade |
1.23 |
180
0.8§ |
0.6 |
| 2 |
DPR-i5500
|
g & i-line Compatible
High Sensitivity Ractangular Profile |
1.17 |
128
0.6§ |
0.4 |
| 3 |
DS-i1000 |
High Sensitivity
Ractangular Profile |
1.7 |
132
0.8§ |
0.6 |
| 4 |
DPR-i7000 |
High Resolution &
Contrast |
1.0 |
534
0.34§ |
0.28 |
| 5 |
DPR-KT061 |
High Resolution &
Contrast Wide Process Margin |
1.4 |
352
0.35§ |
0.28 |
| 6 |
DPR-i7148 |
High Resolution &
Contrast Wide Process Margin |
1.18 |
175
0.35§ |
0.28 |
| 7 |
DPR-i7201 |
High Resolution &
Contrast Multi Purpose(L/S & C/H) |
1.8 |
436
0.50§ |
0.35 |
| Product
Name |
Characteristics |
DTFR-2000
|
Normal Grade
|
| DTFR-3750B |
High Photo Speed
& High Retention
|
| DTFR-710HP |
For 4-Mask Process
& Wide Process Margin |
| DTFR-5022 series |
For Large Size Glass
& High Adhesion |
| DTFR-6000 series |
Ultra High Speed,
Retention & No Mura |
| DTFR-BK100 |
Use the Same Developer
with C/R (KOH 0.04% Sol'n) |
| DTFR-EL100 |
For OLED |
| DTFR-320R |
For Roll Coater |
| |
DNR-L300 |
DNR-H100PL
|
DNR-1030 |
Viscosity
|
22~120
|
220 |
30 |
| Film Thickness(§)
|
2~10
|
4~12 |
2~5 |
| Thermal Properties(¡É)
|
< 120 |
< 150 |
< 250 |
| Reverse Taper Angel
(¡Æ) |
75 |
75 |
65 |
Dongjin offers a full line of deep-UV photoresists
for isolated lines, contact holes, dense lines,
and trenches. Following is an overview of Dongjin's
products:
DHK-LX1000 series is a high resolution & high
yield KrF positive type photoresists that corresponds
to photofabrication (esp. critical layer)
greater than 1G DRAM.
- High Resolution
- Superior Defocus Properties
- Wide Process Margin
- High Contrast Properties
- Good Etch Resistance
DHK-MX1000 series is a thick KrF positive type
photoresists that corresponds to photofabrication
(esp. metal & implant layer) ranging from 64M DRAM to
1G DRAM.
- High Aspect Ratio
- Wide Process Margin
- Low ISO-dense Bias
- Rectangular Profile
DHK-CX1100 series is a KrF positive type photoresists
that corresponds to
photofabrication (esp. contact layer) ranging from 256M
to 1G DRAM.
- High Contrast
- Steep Profile
- Wide Process Margin
- Superior Depth of Focus
DHA-GX20 is a high resolution ArF positive type
photoresist that corresponds to photofabrication
(esp. Isolate layer) of high speed logic and high
resolution memory.
- High Resolution
- Wide Process Margin
- High Etch Selectivity
- Low Line Edge Roughness
DHA-H150 is a high resolution ArF positive type
photoresist that corresponds
to photofabrication (esp. Critical
Dense L/S layer) ranging from 1G DRAM to
4G DRAM.
- High Resolution
- Wide Process Margin
- High Etch Selectivity
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